Everyone wants to take the throne from ASML. Today ASML has decided the throne is higher

ASML, a Dutch company, has unveiled a significant advancement in chip manufacturing technology, potentially boosting global chip production by 50% by 2030. Researchers have developed a method to increase the power of the light source in their Extreme Ultraviolet (EUV) lithography machines. This breakthrough aims to enhance the efficiency and output of semiconductor fabrication, a critical sector for the digital economy. The core innovation lies in achieving 1000 watts of power from the EUV light source, a substantial leap from the current 600 watts. This is accomplished through a refined process involving precisely timed laser pulses on molten tin droplets, creating highly energetic plasma that emits the necessary ultraviolet light. The increased light intensity directly translates to a higher "yield" of functional chips from each silicon wafer. This development has considerable implications for the global semiconductor landscape, directly benefiting ASML and potentially challenging rivals. Manufacturers utilizing these enhanced machines could process an increased number of silicon wafers per hour, leading to greater chip availability. This advancement is pivotal in the ongoing drive for more powerful and efficient microelectronics, impacting everything from consumer devices to advanced computing.